Tio₂ Nanomaterials Synthesized Using a Homemade Atmospheric Pressure Plasma Jet Equipped a Ultrasonic Atomizer
黃智賢1, 張忠誠2, 楊宏毅2*, 周禎英1, 鄧彥箐1, 許皓程1, 符芳裕1, 陳彥尹1
1光電研究所, 國立台灣海洋大學, 基隆市, Taiwan
2電機工程系暨研究所, 國立台灣海洋大學, 基隆市, Taiwan
* presenting author:Steve Yang, email:grandtour901@gmail.com
With the help of a homemade atmospheric pressure plasma jet (APPJ) equipped a ultrasonic atomizer, we have successfully synthesized silicon dioxide (SiO₂) and titanium dioxide (TiO₂)nanomaterials as well as thin films. SEM, X-ray diffraction, Raman spectrum, and absorption were carried out to investigate the grown TiO₂. We found that , when grown on substrates at room temperatures, TiO₂ tends to form nanoparticles. Grown with increased substrate temperatures, it forms thin films with increased quality. Various oxide semiconductors were also carried out. It turns out APPJ is quite an useful and simple technique in the future.

Keywords: Plasma Jet, TiO2 nanoparticles, thin film